WebbAtomic layer deposition (ALD) of cobalt sulfide (Co 9 S 8) is reported.The deposition process uses bis(N,N′-diisopropylacetamidinato)cobalt(II) and H 2 S as the reactants … Webb2, quartz, UV-ozone treated Si, and metallic Ru, Co, and NiSi. The thickness of Cu 3N on Ru substrates (Fig. 5) is typical. Although these experiments were run at a Cu precursor exposure of 0.06 mbar s, which is less than satu-rated, the growth is still linear with number of deposition cycles, at 0.15 Å per cycle. These lines pass through the ori-

Low-temperature pulsed vapor-phase deposition of thin ruthenium …

WebbCo 9 S 8 is an interesting sulfide material with metallic conductivity that has shown promise for various energy applications. Herein, we report a new atomic layer deposition … WebbThe data on the properties of ruthenium layers produced in the temperature range of 110–350°C by pulsed deposition from the vapor phase with participation of the complex … pet emergency clinic thousand oaks

Low temperature atomic layer deposition of Ru thin films using a …

Webb7 feb. 2024 · Three readily available Ru precursors, CpRu(CO) 2 Me, (η 3-allyl)Ru(CO) 3 Br, and (COT)Ru(CO) 3, were employed to investigate the role of precursor quantum yield, … WebbThe data on the properties of ruthenium layers produced in the temperature range of 110–350°C by pulsed deposition from the vapor phase with participation of the complex … WebbThe Ru film nucleated easily on a wide range of substrates (H-terminated Si, TiN, Pt and Al 2 O 3). Although the films are grown at a low temperature, they are considerably pure … pet emergency education coupon